Spectrometer Devices and Fabric from Co-drawn Conducting, Semiconducting, and Insulating Materials

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Professor Yoel Fink
Research Laboratory in Electronics, MIT
External Link (www.rle.mit.edu)
Professor John Joannopoulos
Department of Physics, MIT
External Link (ab-initio.mit.edu)
Ayman Abouraddy
College of Optics and Photonics, University of Central Florida
External Link (www.rle.mit.edu)
Jerimy Arnold
Department of Material Science and Engineering, MIT
External Link (www.rle.mit.edu)
Mehment Bayindir
Research Laboratory of Electronics, MIT
External Link (www.rle.mit.edu)
Shandon Hart
Department of Material Science and Engineering, MIT
External Link (www.rle.mit.edu)
Dursen Hinczewski
Department of Physics, Istanbul Technical University
External Link (dmse.mit.edu)
Fabien Sorin
Research Laboratory in Electronics, MIT
External Link (www.rle.mit.edu)
Ofer Shapira
Research Laboratory in Electronics, MIT
External Link (www.rle.mit.edu)
Jean-Francois Viens
Department of Material Science and Engineering, MIT
External Link (dmse.mit.edu)
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Dave Sossen
MIT Technology Licensing Officer
Patent Protection

Optoelectronic fiber photodetector

US Patent 7,292,758
Crystalline Silicon Core Fibres from Aluminium Core Preforms
Nature Communications, 6 (6248): 1-6, Feb. 20, 2015
Preparation and transmission of low-loss azimuthally polarized pure single mode in multimode photonic band gap fibers
Optics Express, 20 (6): 6029-6035, Mar. 12, 2012


  • Optoelectronic functional fabrics and large area functional surfaces
  • Tunable narrow band fiber photodetectors
  • Fibers for dual electron-photon transport

Problem Addressed

Electronic and optoelectronic devices are typically fabricated using a variety of elaborate wafer-based processes. These afford dense device packing and small feature sizes, but are restricted to planar geometries with limited coverage area. Preform-based fiber-drawing techniques are, in comparison, simpler and yield extended lengths of highly uniform fibers with well controlled geometries and excellent transport characteristics. However, they are only used with a small number of materials and only large-sized features have been implemented.


The technology is a method for drawing extended lengths of fibers made of conducting, semiconducting, and insulated micro-elements in close contact and in a variety of geometries. The fibers are fabricated using low-melting temperature conductors with amorphous semiconductors and insulators into a preform which holds the final fiber geometry. The preform is subsequently drawn into a fiber which preserves the initial geometry while forming intimate interfaces and feature sizes down to below 100 nanometers. Two prototypical functional fiber structures are fibers for dual electron-photon transport and tunable narrow band fiber photodetectors. Both structures demonstrate excellent metal-semiconductor contact and the fibers retained desired electrical and optical properties. The fiber characteristics allow for the construction of optoelectronic functional fabrics by weaving fibers together. This allows for the illumination points to be localized with only order N (instead of N2) fibers. Large area optoelectronic functional surfaces are also enabled with the possibility of determining the direction of observed light.


  • Flexible and mechanically tough fibers great for optoelectronic functional fabrics
  • Simple and highly uniform design
  • Integrates a variety of materials with a variety of device geometries and sizes