Templated Self-Assembly through Restricted Geometry

Technology #15609

Questions about this technology? Ask a Technology Manager

Download Printable PDF

Image Gallery
(Fig 1A) Substrate with templated region, (Fig 1B) Substrate with block copolymer deposited, (Fig 1C) Substrate with block copolymer self-assembled
Professor Karl Berggren
Department of Electrical Engineering and Computer Science, MIT
External Link (www.rle.mit.edu)
Professor Caroline Ross
Department of Materials Science and Engineering, MIT
External Link (dmse.mit.edu)
Jae-Byum Chang
Department of Materials Science and Engineering, MIT
External Link (www.rle.mit.edu)
Hong Kyoon Choi
Department of Materials Science and Engineering, MIT
Adam Hannon
Department of Materials Science and Engineering, MIT
Managed By
Jack Turner
MIT Technology Licensing Officer
Patent Protection

Standardized topographical arrangements for template regions that orient self-assembly

US Patent 8,966,411
Complex Self-Assembled Patterns from a square Grid Template with Restricted Geometry
Aligned Sub-10-nm Block Copolymer Patterns Templated by Post Arrays
ACS Nano, 2012, 6 (3), pp 2071–2077
Design rules for self-assembled block copolymer patterns using tiled templates
Nature Communications, 5:3305 doi: 10.1038/ ncomms4305 (2014)

Complex nano-patterns may be achieved through templated self-assembly of block copolymers. This technology uses a topographic template of a square lattice with a restricted set of geometrical features which can produce predictable complex block copolymer patterns.


  • Integrated Circuit Fabrication
  • Biomolecule Arrays or Sensors
  • Nanowire growth
  • Graphene Patterning
  • Computational Material Development
  • Sub-wavelength photonics


The fabrication of dense, defect free, and arbitrary nanopatterns over a large area is crucial
for semiconductor manufacturing technology or microarray technology, but the
current methods of photolithography and electron beam lithography are limited
by low resolution and low throughput, respectively.


The technology uses a template with restricted geometrical features in order to constrain and determine allowed block copolymer patterns. The template is made from a square lattice to which the block copolymer must conform. By dividing up the target pattern into a grid of allowed block copolymer patterns, this process simplifies the necessary template design for achieving complex nanopatterns.


  • Design principle based on a square lattice with a grid simplifies template design.
  • With this design principle, block copolymer pattern can be predicted with high accuracy