Complex nano-patterns may be achieved through templated self-assembly of block copolymers. This technology uses a topographic template of a square lattice with a restricted set of geometrical features which can produce predictable complex block copolymer patterns.
- Integrated Circuit Fabrication
- Biomolecule Arrays or Sensors
- Nanowire growth
- Graphene Patterning
- Computational Material Development
- Sub-wavelength photonics
fabrication of dense, defect free, and arbitrary nanopatterns over a large area is crucial
for semiconductor manufacturing technology or microarray technology, but the
current methods of photolithography and electron beam lithography are limited
by low resolution and low throughput, respectively.
The technology uses a template with restricted
geometrical features in order to constrain and determine allowed block
copolymer patterns. The template is made from a square lattice to which the
block copolymer must conform. By dividing up the target pattern into a grid of
allowed block copolymer patterns, this process simplifies the necessary
template design for achieving complex nanopatterns.
- Design principle based on a square lattice with a grid simplifies template design.
With this design principle, block copolymer pattern can be predicted with high accuracy